Logistics For Men Deep Pore Cleansing Clay (Normal To Oily Skin)
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A potent, deep-cleansing clay mask for men Contains purifying natural clays vitamins Helps absorb excess oils, tighten pores remove impurities from skin as mask dries Effectively loosens reduces blackheads Restores clean, clear, refined invigorated skin Perfect for normal to oily skin Not recommended for sensitive or fair skin Free of sulfates, synthetic fragrances, synthetic dyes, phthalates, GMOs triclosan
INREDIENTS:
Start by cleansing your face with your regular cleanserTake a quarter-size amount of your face scrub and apply it onto your face in circular motions, while cautiously omitting the eye areaGently massage the product onto the skin for a minuteRinse off with warm water and gently pat your skin with a clean towelFollow up with your hydrating mask, serum or cream
INREDIENTS:
Start by cleansing your face with your regular cleanserTake a quarter-size amount of your face scrub and apply it onto your face in circular motions, while cautiously omitting the eye areaGently massage the product onto the skin for a minuteRinse off with warm water and gently pat your skin with a clean towelFollow up with your hydrating mask, serum or cream
Water (aqua), Kaolin,bentonite, Glyceryl Stearate, Peg-100 Stearate, Glycerin, Propane- Diol, Prunus Armeniaca (apricot)kernel Oil, Lactic Acid, Calendulaoffiginalis Flower Extract, Gaul-theria Procumbens (wintergreen)leaf Extract, Mentha Arvensisleaf Extract, Hydrolyzedvegetable Protein, Aloe Barba-densis Leaf Juice Powder, Citrusaurantium Dulcis (orange) Peeloil, Mentha Arvensis (cornmint)oil, Rosmarinus Officinalis (rose-mary) Oil, Eucalyptus Globulus(eucalyptus) Oil, Mentha Spicata(spearmint) Oil, Ocimumbasillicum (basil) Oil, Panthenol,tocopheryl Acetate, Ascorbicacid, Retinyl Palmitate, Cellulosegum, Sodium Polyacrylate,peg-35castor Oil, Caprylyl Glycol,sodium Hydroxide, Disodium Edta,guaiazulene, Bht, Phenoxy-ethanol, Chlorphenesin,potassium Sorbate, Sodiumbenzoate, Methylisothia-zolinone, Benzyl Alcohol,iron Oxides (ci77491)
